The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2024

Filed:

Dec. 02, 2021
Applicant:

Ciena Corporation, Hanover, MD (US);

Inventors:

Emil Janulewicz, Ottawa, CA;

Sergio Slobodrian, Richmond, CA;

Assignee:

Ciena Corporation, Hanover, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 18/21 (2023.01); G06F 18/214 (2023.01);
U.S. Cl.
CPC ...
G06F 18/2185 (2023.01); G06F 18/2148 (2023.01);
Abstract

In various embodiments, the present disclosure relates to systems and methods for enhanced reinforcement learning (RL) algorithms using future state prediction. In some embodiments, an offline emulator can be applied allowing the generation of samples, thus supporting continuous training of the system and fast-forward fabric saturation. The fabric accepts transactions which allocate resources with respect to the transactions needs and constraints and contains an RL/AI model(s) which are continuously learning based on the current reward combined with reward scaling. By modelling the fabric and transactions in an emulator, it is possible to predict future states and calculate adjusted rewards with respect to the optimal criterion. A state generator is based on modeling past historical transactions, allowing a user to anticipate future state characteristics of the fabric. In some embodiments, online learning is based on adjusted rewards which are more representative with respect to the objective function.


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