The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2024

Filed:

Dec. 01, 2022
Applicant:

Savant Technologies Llc, East Cleveland, OH (US);

Inventors:

Bin Li, Shanghai, CN;

Kun Xiao, Shanghai, CN;

Jie Gao, Shanghai, CN;

Hai Huang, Shanghai, CN;

Assignee:

SAVANT TECHNOLOGIES LLC, East Cleveland, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21S 10/00 (2006.01); F21S 10/06 (2006.01); F21V 14/00 (2018.01); F21V 14/04 (2006.01); F21V 14/06 (2006.01); F21W 121/00 (2006.01); F21Y 113/20 (2016.01); F21Y 115/30 (2016.01);
U.S. Cl.
CPC ...
F21S 10/007 (2013.01); F21S 10/06 (2013.01); F21V 14/04 (2013.01); F21V 14/06 (2013.01); F21W 2121/008 (2013.01); F21Y 2113/20 (2016.08); F21Y 2115/30 (2016.08);
Abstract

Provided is a projection device and projection system that includes a first light source which emits a first light beam, a diffraction part on which first predetermined pattern is provided, and the diffraction part diffracts at least a part of the first light beam emitted from the first light source to form first pattern corresponding to the first predetermined pattern, and a reflection part on which one or more second predetermined patterns are provided, the reflection part reflects a second light beam incident thereon to form second pattern corresponding to the one or more second predetermined patterns, and one of the first pattern and the second pattern forms projection pattern or both of the first pattern and the second pattern are superposed to form projection pattern.


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