The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2024
Filed:
Feb. 05, 2021
Shanghai Zhengshi Technology Co., Ltd., Shanghai, CN;
Weidong Man, Shanghai, CN;
Changzheng Zhu, Shanghai, CN;
Chuang Gong, Shanghai, CN;
Jianbo Wu, Shanghai, CN;
Jianhong Jiang, Shanghai, CN;
SHANGHAI ZHENGSHI TECHNOLOGY CO., LTD., Shanghai, CN;
Abstract
A method for preparing a diamond is disclosed. The method includes: processing a substrate material of a substrate holder to obtain a surface that is easily separated from diamond films, using a plasma chemical vapor deposition method to form a diamond film layer on the surface of the substrate holder, the plasma chemical vapor deposition method using multi-energy source coupled plasma and, post-processing the diamond film layer to remove impurity material on the diamond surface and a nucleation layer and/or stress layer with inconsistent properties of a main body of the diamond film. The method has the advantages of controllable thickness, controllable quality, controllable cost, etc., and lays the foundation for diamond in the fields of cutting tools and heat sinks.