The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2024

Filed:

Aug. 22, 2022
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Joshua Tyler Mook, Loveland, OH (US);

William Joseph Steele, Lawrenceburg, IN (US);

Mary Kathryn Thompson, Fairfield Township, OH (US);

David Scott Simmermon, Felicity, OH (US);

Michael Thomas Gansler, Mason, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/064 (2014.01); B22F 10/20 (2021.01); B22F 10/28 (2021.01); B22F 10/36 (2021.01); B22F 10/366 (2021.01); B22F 12/44 (2021.01); B23K 26/06 (2014.01); B23K 26/067 (2006.01); B23K 26/073 (2006.01); B23K 26/342 (2014.01); B29C 64/153 (2017.01); B33Y 30/00 (2015.01); G02B 3/00 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
B23K 26/064 (2015.10); B22F 10/20 (2021.01); B22F 10/28 (2021.01); B22F 10/36 (2021.01); B22F 10/366 (2021.01); B22F 12/44 (2021.01); B23K 26/0643 (2013.01); B23K 26/0676 (2013.01); B23K 26/0738 (2013.01); B23K 26/342 (2015.10); B29C 64/153 (2017.08); B33Y 30/00 (2014.12); G02B 3/0056 (2013.01); G02B 26/0833 (2013.01); B23K 26/0648 (2013.01);
Abstract

An irradiation device for additively manufacturing three-dimensional objects may include a beam generation device configured to generate an energy beam, an optical modulator including a micromirror array disposed downstream from the beam generation device, and a focusing lens assembly disposed downstream from the optical modulator. The micromirror array may include a plurality of micromirror elements configured to reflect a corresponding plurality of beam segment of the energy beam along a beam path incident upon the focusing lens assembly. The focusing lens assembly may include one or more lenses configured to focus the plurality of beam segments such that for respective ones of a plurality of modulation groups including a subset of micromirror elements, a corresponding subset of beam segments are focused to at least partially overlap with one another at a combination zone corresponding to the respective modulation group.


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