The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2024

Filed:

Nov. 10, 2021
Applicant:

Samsung Sdi Co., Ltd., Yongin-si, KR;

Inventors:

Kyungsoo Moon, Suwon-si, KR;

Eunmi Kang, Suwon-si, KR;

Jaehyun Kim, Suwon-si, KR;

Jimin Kim, Suwon-si, KR;

Changsoo Woo, Suwon-si, KR;

Hwansung Cheon, Suwon-si, KR;

Seungyong Chae, Suwon-si, KR;

Seung Han, Suwon-si, KR;

Assignee:

Samsung SDI Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07F 7/22 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0042 (2013.01); C07F 7/2224 (2013.01);
Abstract

A semiconductor photoresist composition and a method of forming patterns utilizing the same are provided. The semiconductor photoresist composition includes a condensed product produced by a condensation reaction between an organotin compound represented by Chemical Formula 1 and at least one organic acid compound selected from a substituted organic acid, an organic acid including at least two acid functional groups, and a substituted or unsubstituted sulfonic acid; and a solvent. Specific details of Chemical Formula 1 are as defined in the specification.


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