The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2024

Filed:

Dec. 17, 2019
Applicant:

Lumicks Dsm Holding B.v., Amsterdam, NL;

Inventors:

Gerrit Sitters, Amsterdam, NL;

Mattijs De Groot, Amsterdam, NL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/64 (2006.01); G02B 21/00 (2006.01); G02B 21/06 (2006.01); G02B 21/16 (2006.01); G02B 21/26 (2006.01);
U.S. Cl.
CPC ...
G01N 21/6458 (2013.01); G02B 21/0076 (2013.01); G02B 21/008 (2013.01); G02B 21/06 (2013.01); G02B 21/16 (2013.01); G02B 21/26 (2013.01); G02B 21/0036 (2013.01);
Abstract

A method of excitation microscopy, in particular STimulated Emission Depletion (STED) microscopy, ins provided which comprises: providing a sample; trapping an object in the sample at a trapping position, in particular by applying a position dependent trapping force to the object; positioning, in particular focusing, a depletion beam at an interaction position in the sample for illumination of a portion of the sample associated with the trapped object. The method comprises at least one of controlling the depletion beam such that, at least when the depletion beam is positioned at the interaction position, an optical force exerted by the depletion beam on the object causes a displacement of the object less than the optical resolution, preferably less than half the optical resolution of an imaging system for observing a STED fluorescence; and controlling at least one of the depletion beam and the trapping force on the object such that, at least when the depletion beam is positioned at the interaction position, an optical force exerted by the depletion beam on the object is less than 5% of the trapping force, preferably less than 3%, more preferably less than 1%. An according system is also provided.


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