The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2024
Filed:
Jan. 22, 2021
Applicant:
Unitika Ltd., Osaka, JP;
Inventors:
Akiko Kurosawa, Uji, JP;
Atsuko Noda, Uji, JP;
Assignee:
UNITIKA LTD., Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08J 5/18 (2006.01); B32B 27/34 (2006.01); C08J 11/10 (2006.01); C08L 77/02 (2006.01);
U.S. Cl.
CPC ...
C08J 5/18 (2013.01); B32B 27/34 (2013.01); C08J 11/10 (2013.01); C08L 77/02 (2013.01); B32B 2272/00 (2013.01); B32B 2305/70 (2013.01); B32B 2307/518 (2013.01); B32B 2307/704 (2013.01); B32B 2307/75 (2013.01); B32B 2439/00 (2013.01); C08L 2207/20 (2013.01);
Abstract
To provide a method for producing a polyamide resin film by using a polyamide resin obtained through polymerization of a regenerated monomer used as a recycled material. Provided is a method for producing a polyamide resin film, including: (1) a step of producing a monomer from a raw material (A) for depolymerization, (2) a step of producing a polyamide resin (B) through polymerization using a raw material containing the monomer. (3) a step of refining the polyamide resin (B), and (4) a step of producing an unstretched film using a starting material containing the refined polyamide resin (B), and stretching the unstretched film.