The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2024

Filed:

Oct. 26, 2020
Applicant:

Battelle Memorial Institute, Columbus, OH (US);

Inventors:

Lindy E. Dejarme, Columbus, OH (US);

Kavitha Dasu, Powell, OH (US);

Assignee:

Battelle Memorial Institute, Columbus, OH (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/52 (2023.01); C01B 33/12 (2006.01); C02F 1/02 (2023.01); C02F 1/72 (2023.01); C03C 3/089 (2006.01); C02F 101/36 (2006.01);
U.S. Cl.
CPC ...
C02F 1/5236 (2013.01); C01B 33/12 (2013.01); C02F 1/02 (2013.01); C02F 1/722 (2013.01); C03C 3/089 (2013.01); C02F 2101/36 (2013.01); C02F 2101/40 (2013.01);
Abstract

We have discovered that heating PFAS in the presence of silica resulted in destruction of over 90% of PFAS under surprisingly mild conditions. Experimental results are presented showing that the reaction occurs along with etching of the silica glass, presumably caused by HF created during the reaction or in previous reactions. The methods of destroying PFAS are especially effective for treating relatively concentrated solutions such as those commonly encountered in AFFF waste stock and cleanup near fire-fighting training sites, as well as concentrated waste solutions from industrial sites involving the manufacture or application of PFAS.


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