The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2024

Filed:

Dec. 03, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Eunjung Cha, Adliswill, CH;

Cezar Bogdan Zota, Rueschlikon, CH;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/778 (2006.01); H01L 21/285 (2006.01); H01L 21/3213 (2006.01); H01L 29/40 (2006.01); H01L 29/41 (2006.01); H01L 29/423 (2006.01); H01L 29/43 (2006.01); H01L 29/47 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/778 (2013.01); H01L 29/401 (2013.01); H01L 29/413 (2013.01); H01L 29/42316 (2013.01); H01L 29/437 (2013.01); H01L 29/475 (2013.01); H01L 29/66462 (2013.01); H01L 21/28581 (2013.01); H01L 21/28587 (2013.01); H01L 21/32136 (2013.01);
Abstract

A transistor structure, includes a buffer layer and a quantum well channel layer on top of the buffer layer. There is a barrier layer on top of the channel layer. There is a drain contact on a channel stack. A source contact is on a channel stack. A gate structure is located between the source contact and drain contact, comprising: an active gate portion having a bottom surface in contact with a bottom surface of the source and the drain contacts. A superconducting portion of the gate structure is in contact with, and adjacent to, an upper part of the active gate portion.


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