The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2024
Filed:
Apr. 11, 2022
Applicant:
Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;
Inventor:
Hiroshi Shirouzu, Osaka, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32935 (2013.01); H01J 37/32082 (2013.01); H01J 37/32926 (2013.01);
Abstract
A disclosed plasma processing systemincludes: a plasma processing apparatusincluding a processing chamberfor plasma processing an objectto be processed, and at least one componentwhich is at least partially disposed in the processing chamber; a storage unitfor storing a recipe including a set value specifying a plasma processing condition; a tolerance determination unitthat determines a tolerance of the set value, based on a degree of deterioration of the at least one component; and a recipe modification unitthat modifies the recipe such that the set value falls within the tolerance, when the set value is outside the tolerance.