The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2024
Filed:
Mar. 10, 2021
Fujifilm Corporation, Tokyo, JP;
Masaaki Oosake, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
There are provided a learning apparatus and a learning method that can facilitate creation of teaching data and prevent overtraining. A learning apparatus () includes a first database that stores a first image set in which a first image for learning and coordinate information for identifying a region larger than a region of interest included in the first image are associated with each other, and a second database that stores a second image set in which a second image for learning and second mask data for identifying a region of interest included in the second image are associated with each other. In a case of using the first image set to update a parameter of a CNN () (in a case of performing learning), a mask data creation unit () creates first mask data on the basis of the coordinate information for identifying the region larger than the region of interest. The first image and the second image are used as input images for the CNN (), and the first mask data and the second mask data are used as teaching data to update the parameter of the CNN ().