The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2024

Filed:

Mar. 05, 2020
Applicants:

Dalian University of Technology, Liaoning, CN;

Peng Cheng Laboratory, Guangdong, CN;

Inventors:

Wei Zhong, Liaoning, CN;

Hong Zhang, Liaoning, CN;

Haojie Li, Liaoning, CN;

Zhihui Wang, Liaoning, CN;

Risheng Liu, Liaoning, CN;

Xin Fan, Liaoning, CN;

Zhongxuan Luo, Liaoning, CN;

Shengquan Li, Liaoning, CN;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/593 (2017.01); G06T 3/4076 (2024.01); G06V 10/40 (2022.01); G06V 10/44 (2022.01);
U.S. Cl.
CPC ...
G06T 7/593 (2017.01); G06T 3/4076 (2013.01); G06V 10/40 (2022.01); G06V 10/443 (2022.01); G06T 2207/20084 (2013.01);
Abstract

The present invention discloses a disparity estimation optimization method based on upsampling and exact rematching, which conducts exact rematching within a small range in an optimized network, improves previous upsampling methods such as neighbor interpolation and bilinear interpolation for disparity maps or cost maps, and works out a propagation-based upsampling method by the way of network so that accurate disparity values can be better restored from disparity maps in the upsampling process.


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