The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2024

Filed:

Apr. 22, 2021
Applicant:

Emc Ip Holding Company Llc, Hopkinton, MA (US);

Inventors:

Bhaskar Bora, Shrewsbury, MA (US);

Deepak Vokaliga, Hopkinton, MA (US);

Mark J. Halstead, Holliston, MA (US);

Jeffrey Wilson, Franklin, MA (US);

William R. Stronge, Westford, MA (US);

Ian Adams, Cambridge, MA (US);

Assignee:

EMC IP Holding Company LLC, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/27 (2019.01); G06F 11/14 (2006.01);
U.S. Cl.
CPC ...
G06F 16/275 (2019.01); G06F 16/27 (2019.01); G06F 11/1446 (2013.01); G06F 2201/84 (2013.01);
Abstract

Snapshots from a first LSU (R1) on a first storage system (A1) may be replicated to a second replica LSU (R2) on a second storage system (A2), for example, concurrently to remotely replicating (e.g., synchronously) write operations for R1 to R2. A process, P, on A1 executing the replication of the snapshots from R1 to R2 may be a separate process than the one or more processes on A1 executing remote replication of write operations for R1 to R2. During a consistency window on A1, outstanding write operations for R1 at the time the consistency window opened may be logged, and a pair of snapshots, SS1and SS1may be activated on R1 and R2, respectively. After the consistency window has closed, the SS1snapshot metadata and snapshot data may be updated based on the outstanding write operations.


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