The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2024
Filed:
Apr. 03, 2020
Applicant:
Malvern Panalytical B.v., Almelo, NL;
Inventors:
Milen Gateshki, Almelo, NL;
Alexander Kharchenko, Almelo, NL;
Detlef Beckers, Almelo, NL;
Nicholas Norberg, Almelo, NL;
Assignee:
Malvern Panalytical B.V., Almelo, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/20008 (2018.01); G01N 23/207 (2018.01);
U.S. Cl.
CPC ...
G01N 23/207 (2013.01); G01N 23/20008 (2013.01); G01N 2223/056 (2013.01); G01N 2223/1016 (2013.01); G01N 2223/306 (2013.01); G01N 2223/316 (2013.01); G01N 2223/3306 (2013.01); G01N 2223/606 (2013.01); G01N 2223/607 (2013.01);
Abstract
A beam shaping apparatus () for use in an X-ray analysis device (). The beam shaping apparatus processes an input beam () from an X-ray beam source (), and generates an output beam () with an output beam shape for irradiating a sample () held by a sample holder () of the X-ray analysis device. Movement of the output beam shape is controlled in dependence upon a varying tilt angle (χ) of the sample (), this defined by a tilt position of the sample holder ().