The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2024
Filed:
Nov. 12, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Atul Bhaskar Chaudhari, Mumbai, IN;
Sivapackia Ganapathiappan, Los Altos, CA (US);
Srobona Sen, Maharashtra, IN;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B33Y 70/00 (2020.01); B24B 37/24 (2012.01); C08G 18/10 (2006.01); C08G 18/24 (2006.01); C08G 18/42 (2006.01); C08G 18/67 (2006.01); C09D 11/102 (2014.01); C09D 11/30 (2014.01);
U.S. Cl.
CPC ...
C09D 11/102 (2013.01); B24B 37/24 (2013.01); B33Y 70/00 (2014.12); C08G 18/10 (2013.01); C08G 18/246 (2013.01); C08G 18/4238 (2013.01); C08G 18/6755 (2013.01); C09D 11/30 (2013.01);
Abstract
A system, formulation, and method for additive manufacturing of a polishing layer of a polishing pad. The formulation includes a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol. The techniques includes selecting the difunctional polyol or the difunctional polythiol to affect a property of the polishing layer. The formulation also includes a monomer and a photoinitiator. The viscosity of the formulation is applicable for 3D printing of the polishing layer.