The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2024

Filed:

Nov. 02, 2018
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Justin Mamrak, Loveland, OH (US);

Mackenzie Ryan Redding, Mason, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/153 (2017.01); B22F 10/32 (2021.01); B22F 10/322 (2021.01); B22F 10/50 (2021.01); B22F 12/00 (2021.01); B22F 12/20 (2021.01); B22F 12/49 (2021.01); B22F 12/70 (2021.01); B29C 64/371 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B22F 10/14 (2021.01); B22F 10/25 (2021.01); B22F 10/28 (2021.01); B22F 10/77 (2021.01); B22F 12/67 (2021.01);
U.S. Cl.
CPC ...
B29C 64/153 (2017.08); B22F 10/32 (2021.01); B22F 10/322 (2021.01); B22F 10/50 (2021.01); B22F 12/20 (2021.01); B22F 12/22 (2021.01); B22F 12/49 (2021.01); B22F 12/70 (2021.01); B29C 64/371 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B22F 10/14 (2021.01); B22F 10/25 (2021.01); B22F 10/28 (2021.01); B22F 10/77 (2021.01); B22F 12/67 (2021.01); B22F 2201/02 (2013.01); B22F 2201/11 (2013.01);
Abstract

An additive manufacturing machine () includes a plurality of subsystems, such as a condensate evacuation subsystem () for removing byproducts of the additive manufacturing products near a powder bed, a closed loop subsystem () for cleaning contaminants from sensitive machine components (), and/or an electronics cooling subsystem () for cooling an electronics compartment (). Each subsystem () may include a dedicated gas circulation loop () that is operably coupled to a gas circulation device () for urging a clean flow of gas () to each of the subsystems () to perform a particular function.


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