The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2024
Filed:
Nov. 29, 2021
Zhejiang Quhua Fluor-chemistry Co., Ltd., Hangzhou, CN;
Beijing University of Chemical Technology, Beijing, CN;
Juhua Group Co., Ltd, Hangzhou, CN;
Liangliang Zhang, Beijing, CN;
Liyang Zhou, Hangzhou, CN;
Guangwen Chu, Beijing, CN;
Jihong Tong, Hangzhou, CN;
Jianfeng Chen, Beijing, CN;
Jiangyong Hong, Hangzhou, CN;
Bo Yang, Hangzhou, CN;
ZHEJIANG QUHUA FLUOR-CHEMISTRY Co., Ltd., Hangzhou, CN;
Beijing University of Chemical Technology, Beijing, CN;
Juhua Group Co., Ltd, Hangzhou, CN;
Abstract
A reaction apparatus used for a continuous reaction process for the preparation of trifluoroethane includes a housing, a rotary cutting component, a submersible pump and a flow deflector. The flow deflector includes two sets of flow-deflecting plates, each set of said flow-deflecting plates including a plurality of flow-deflecting plates. Two sets of flow-deflecting plates are fixed to each of the two opposing side walls, and the two adjacent flow-deflecting plates are in offset alignment. The submersible pump is arranged inside the reaction chamber body. A liquid inlet line can connect a directly to the submersible pump without requiring the arrangement of an additional pipeline.