The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2024
Filed:
Aug. 21, 2020
Duelight Llc, Sunnyvale, CA (US);
William Guie Rivard, Menlo Park, CA (US);
Brian J. Kindle, Sunnyvale, CA (US);
Adam Barry Feder, Mountain View, CA (US);
DUELIGHT LLC, Sunnyvale, CA (US);
Abstract
A system, method, and computer program product are provided for generating a focus sweep to produce a focus stack. In use, an image is sampled as image data. Next, a first focus region is identified and a second focus region is identified. Next, first focus target information corresponding to the first focus region is determined and second focus target information corresponding to the second focus region is determined. Further, a focus is adjusted, based on the first focus target information and at least one first image is captured based on the first focus target information. Additionally, the focus is adjusted, based on the second focus target information and at least one second image is captured based on the second focus target information. Lastly, the at least one first image and the at least one second image are saved to an image stack. Additional systems, methods, and computer program products are also presented.