The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2024
Filed:
Apr. 19, 2019
Ecole Polytechnique, Palaiseau, FR;
Centre National DE LA Recherche Scientifique, Paris, FR;
Universite Paris Saclay, Saint-Aubin, FR;
ECOLE POLYTECHNIQUE, Palaiseau, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, Paris, FR;
UNIVERSITE PARIS SACLAY, Saint-Aubin, FR;
Abstract
A method for generating ultrashort pulses includes directing a master beam having ultrashort pulses and at least one slave beam through an optical gate material. The intensity of the slave beam upstream of the optical gate material is lower than that of the master beam upstream of the optical gate material. The optical gate material and the pulses of the master beam are chosen to induce a Kerr effect when the master beam passes through the optical gate material, the Kerr effect producing a modulation of the phase of the slave beam in association with pulses of the master beam when the slave beam passes through the optical gate material. The modulation of the phase of the slave beam is transformed into a modulation of the amplitude thereof using a complementary optical device to generate a slave beam downstream of the optical gate material having ultrashort pulses.