The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2024

Filed:

Feb. 08, 2021
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Kazunari Yagi, Haibara-gun, JP;

Akihiro Kaneko, Haibara-gun, JP;

Takashi Kawashima, Haibara-gun, JP;

Akiyoshi Goto, Haibara-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); C08F 220/58 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C08F 212/24 (2020.02); C08F 220/1806 (2020.02); C08F 220/585 (2020.02); G03F 7/038 (2013.01);
Abstract

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).


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