The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2024
Filed:
May. 04, 2021
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Assignee:
Merck Patent GmbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/60 (2006.01); C08G 77/62 (2006.01); C09D 183/16 (2006.01);
U.S. Cl.
CPC ...
C08G 77/60 (2013.01); C08G 77/62 (2013.01); C09D 183/16 (2013.01);
Abstract
[Problem] To provide a polycarbosilazane making it possible to form a silicon-containing film which is bearable to acid etching, and a composition comprising the polycarbosilazane. [Means for Solution] The present invention provides a polycarbosilazane comprising a repeating unit of —[RRSi—(CH)]— and —(RRSi—NR)—, wherein R, R, Rand Rare each independently a single bond, hydrogen or Calkyl; Ris independently a single bond or hydrogen; and n is 1-2, and a composition comprising the polycarbosilazane. The present invention also provides a method for forming a silicon-containing film, comprising coating the composition above a substrate and heating.