The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2024

Filed:

Jul. 04, 2019
Applicants:

Basf SE, Ludwigshafen am Rhein, DE;

Universidad Del Paìs Vasco / Euskal Herriko Unibertsitatea, Leioa, ES;

Inventors:

Massimo Bandiera, Trostberg, DE;

Roelof Balk, Ludwigshafen am Rhein, DE;

Bastiaan Lohmeijer, Ludwigshafen am Rhein, DE;

Maria Jesus Barandiaran, Leioa, ES;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 3/07 (2006.01); C08F 265/06 (2006.01); C09D 151/00 (2006.01);
U.S. Cl.
CPC ...
C08F 265/06 (2013.01); C08J 3/07 (2013.01); C09D 151/003 (2013.01); C08J 2351/00 (2013.01);
Abstract

The present invention relates to a process for producing an aqueous polymer dispersion of polymerized ethylenically unsaturated monomers, where the process has a first polymerization step as an aqueous radical emulsion polymerization of a first monomer composition M.a and a subsequent further polymerization step as an aqueous radical emulsion polymerization of a second monomer composition M.b, where the monomers M comprise at least one monomer M0 which is selected from compounds of formula 1, wherein X is Cl, Br or OS(O)R, Y is H, Cl, Br, OS(O)R, C-C-alkyl, or C(═O)OR, Ris H or C-C-alkyl, Ris H or C-C-alkyl, Ris C-C-alkyl, Ris C-C-alkyl, Ris C-C-alkyl. The invention also relates to an aqueous polymer dispersion obtainable by such a process as well as the use of such dispersions.


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