The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2024

Filed:

Sep. 29, 2022
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Hiroshi Ashihara, Tokyo, JP;

Yuji Takebayashi, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67712 (2013.01); H01L 21/67173 (2013.01); H01L 21/67201 (2013.01); H01L 21/67736 (2013.01); H01L 21/67745 (2013.01); H01L 21/68764 (2013.01);
Abstract

There is provided a technique that includes: at least one process chamber in which at least one substrate is processed; a mounting stage configured to be capable of mounting the at least one substrate on the mounting stage; a transport chamber including a conveyor configured to be capable of holding the mounting stage at least two places in a vertical direction and transporting the mounting stage; and a controller configured to be capable of performing a transport control of the conveyor in the transport chamber.


Find Patent Forward Citations

Ashihara, Hiroshi. (2024). Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and recording medium (U.S. Patent No. 11996311). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11996311

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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