The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2024
Filed:
Mar. 18, 2022
Screen Holdings Co., Ltd., Kyoto, JP;
SCREEN HOLDINGS CO., LTD., , JP;
Abstract
A substrate processing apparatusincludes a processing unit, a reservoir, a processing liquid pipe, a pump, a filter, a first flow rate section, a first return pipe, a first adjustment valve, a second return pipe, a branch supply pipe, a second flow rate section, and a controller. The first flow rate sectionis placed in the processing liquid pipeand measures a flow rate or pressure of the processing liquid flowing through the processing liquid pipe. The first adjustment valveis placed in the first return pipeand adjusts a flow rate of the processing liquid flowing through the first return pipe. The controller controls an opening degree of the first adjustment valvebased on the flow rate or the pressure of the processing liquid measured by the first flow rate section