The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2024

Filed:

Sep. 30, 2022
Applicant:

Headway Technologies, Inc., Milpitas, CA (US);

Inventors:

Koji Shimazawa, Cupertino, CA (US);

Shengyuan Wang, San Jose, CA (US);

Yukinori Ikegawa, Cupertino, CA (US);

Assignee:

Headway Technologies, Inc., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/31 (2006.01); B82Y 20/00 (2011.01); G02B 5/00 (2006.01); G11B 7/1387 (2012.01); G11B 5/00 (2006.01);
U.S. Cl.
CPC ...
G11B 5/314 (2013.01); B82Y 20/00 (2013.01); G02B 5/008 (2013.01); G11B 5/3163 (2013.01); G11B 7/1387 (2013.01); G11B 2005/0021 (2013.01);
Abstract

The present embodiments relate to a heat-assisted magnetic recording (HAMR) write head with an iridium (Ir) film. The Ir film can include a body layer and a plasmon generator (PG) film comprising Iridium with a thin Ir seed layer. The Ir seed layer can be in direct contact with a dielectric (aluminum oxide). The thickness of the Ir film can be 40 nanometers or less including both a body layer and the seed layer. Incorporating Iridium as a material used for a PG can be a high surface plasmon efficient material with also being reliable under high temperature irradiation during a heat-assisted writing process.


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