The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2024
Filed:
Nov. 03, 2021
Republic of Korea (National Forensic Service Director Ministry of the Interior and Safety), Wonju-si, KR;
Nam Kyu Park, Bucheon-si, KR;
Byung Seon Moon, Busan, KR;
Jae Mo Goh, Wonju-si, KR;
Jin Pyo Kim, Daejeon, KR;
Young Il Seo, Wonju-si, KR;
Eun Ah Joo, Yongin-si, KR;
Je Hyun Lee, Wonju-si, KR;
Sang Yoon Lee, Wonju-si, KR;
Abstract
A developed impact mark analysis apparatus includes: an image acquisition unit configured to obtain at least one first image by photographing impact marks that are developed, and to obtain a second image of impact marks at a crime scene that are developed from evidence at the crime scene; an outliner configured to outline the at least one first image to obtain at least one first outline image, and to outline the second image to obtain a second outline image; a database configured to store the first outline image corresponding to related tool characteristic information; a matching unit configured to search the database for the first outline image determined to be similar to the second outline image and match them with each other; a display unit; and a user input unit.