The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2024

Filed:

Sep. 07, 2021
Applicant:

Honor Device Co., Ltd., Shenzhen, CN;

Inventors:

Yang Hu, Shenzhen, CN;

Xiaofeng Yuan, Shenzhen, CN;

Xiang Luo, Shenzhen, CN;

Zhiwei Li, Shenzhen, CN;

Zefei Dou, Shenzhen, CN;

Assignee:

HONOR DEVICE CO., LTD., Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/06 (2006.01);
U.S. Cl.
CPC ...
G06F 3/0604 (2013.01); G06F 3/0632 (2013.01); G06F 3/0653 (2013.01); G06F 3/0673 (2013.01);
Abstract

This application provides a method and an apparatus for adjusting a memory configuration parameter. The method includes: obtaining a plurality of pieces of resource pressure, where the plurality of pieces of resource pressure are used to indicate a plurality of requirements for memory compression; and adjusting a memory configuration parameter based on the plurality of pieces of resource pressure, where there is a preset correspondence between the memory configuration parameter and each of the plurality of pieces of resource pressure. The resource pressure is, for example, processor pressure, I/O pressure, memory reclaim pressure, or memory swap space pressure. Memory compression requirements corresponding to different types of resource pressure are different. In the memory adjustment method provided in this application, a plurality of types of information are comprehensively considered, so that system performance can be optimized, and a memory management effect can be improved.


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