The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2024
Filed:
Jan. 23, 2019
Applicant:
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Inventors:
Tomoko Fujii, Katsushika-ku, JP;
Kazuhiko Ikeda, Ashigarakami-gun, JP;
Shun Fukazawa, Ashigarakami-gun, JP;
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC., Chiyoda-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/38 (2006.01); B29C 45/14 (2006.01); B32B 15/08 (2006.01); B32B 15/088 (2006.01); B32B 15/09 (2006.01); B32B 15/20 (2006.01); B32B 27/20 (2006.01); B32B 27/28 (2006.01); B32B 27/34 (2006.01); B32B 27/36 (2006.01); C09D 167/02 (2006.01); C09D 177/00 (2006.01); C09D 181/02 (2006.01); C23F 1/02 (2006.01); C23F 1/14 (2006.01); B29K 705/02 (2006.01);
U.S. Cl.
CPC ...
C23C 18/38 (2013.01); B29C 45/14311 (2013.01); B32B 15/08 (2013.01); B32B 15/088 (2013.01); B32B 15/09 (2013.01); B32B 15/20 (2013.01); B32B 27/20 (2013.01); B32B 27/286 (2013.01); B32B 27/34 (2013.01); B32B 27/36 (2013.01); C09D 167/02 (2013.01); C09D 177/00 (2013.01); C09D 181/02 (2013.01); C23F 1/02 (2013.01); C23F 1/14 (2013.01); B29K 2705/02 (2013.01); B32B 2250/02 (2013.01); B32B 2262/101 (2013.01); B32B 2307/538 (2013.01); B32B 2307/54 (2013.01); B32B 2605/08 (2013.01); B32B 2605/18 (2013.01);
Abstract
An aqueous solution for surface treatment, for treating a surface of an alloy, the aqueous solution comprising: a copper compound at a copper ion concentration of 20000 ppm or more and 50000 ppm or less; a heterocyclic nitrogen compound at a concentration of 200 ppm or more and 3000 ppm or less; and a halide ion at a concentration of 2000 ppm or more and 70000 ppm or less.