The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2024

Filed:

Nov. 30, 2022
Applicants:

Applied Materials, Inc., Santa Clara, CA (US);

The Regents of the University of California, Oakland, CA (US);

Inventors:

Keith Tatseun Wong, Los Gatos, CA (US);

Srinivas D. Nemani, Sunnyvale, CA (US);

Andrew C. Kummel, San Diego, CA (US);

James Huang, La Jolla, CA (US);

Yunil Cho, La Jolla, CA (US);

Assignees:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 28/04 (2006.01);
U.S. Cl.
CPC ...
C23C 16/405 (2013.01); C23C 16/45523 (2013.01); C23C 28/04 (2013.01);
Abstract

Embodiments described and discussed herein provide methods for selectively depositing a metal oxides on a substrate. In one or more embodiments, methods for forming a metal oxide material includes positioning a substrate within a processing chamber, where the substrate has passivated and non-passivated surfaces, exposing the substrate to a first metal alkoxide precursor to selectively deposit a first metal oxide layer on or over the non-passivated surface, and exposing the substrate to a second metal alkoxide precursor to selectively deposit a second metal oxide layer on the first metal oxide layer. The method also includes sequentially repeating exposing the substrate to the first and second metal alkoxide precursors to produce a laminate film containing alternating layers of the first and second metal oxide layers. Each of the first and second metal alkoxide precursors contains a different metal selected from titanium, zirconium, hafnium, aluminum, or lanthanum.


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