The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2024

Filed:

Mar. 11, 2020
Applicants:

Chengdu Boe Optoelectronics Technology Co., Ltd., Sichuan, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Yong Zheng, Beijing, CN;

Shuai Du, Beijing, CN;

Wenbiao Ding, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); B05C 21/00 (2006.01); C23C 14/24 (2006.01); C25D 1/10 (2006.01); C25D 3/38 (2006.01); C25D 3/54 (2006.01); H10K 71/16 (2023.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); B05C 21/005 (2013.01); C23C 14/24 (2013.01); C25D 1/10 (2013.01); C25D 3/38 (2013.01); C25D 3/54 (2013.01); H10K 71/166 (2023.02);
Abstract

A mask has a mask pattern region and a non-mask pattern region located at a peripheral of the mask pattern region. The mask pattern region includes at least one effective mask region. In any effective mask region, the mask includes a plurality of evaporation holes and at least one shielding; strip. Each shielding, strip is located between two adjacent evaporation holes. The mask has at least one welding region in the non-mask pattern region. A thickness of a portion of the mask in the non-mask pattern region and at least in the welding region is greater than a thickness of the shielding strip of the mask in the effective mask region, and the thickness refers to a dimension of the corresponding portion along a direction perpendicular to a plane where the mask is located.


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