The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2024

Filed:

Jan. 30, 2021
Applicant:

Tosoh Quartz Corporation, Yamagata, JP;

Inventors:

Takashi Taniguchi, Yamagata, JP;

Chiemi Ito, Yamagata, JP;

Takaya Suzuki, Yamagata, JP;

Yuka Oba, Yamagata, JP;

Assignee:

TOSOH QUARTZ CORPORATION, Yamagata, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 3/06 (2006.01); C03B 19/06 (2006.01); C03C 4/02 (2006.01);
U.S. Cl.
CPC ...
C03C 3/06 (2013.01); C03B 19/063 (2013.01); C03B 19/066 (2013.01); C03C 4/02 (2013.01); C03C 2201/02 (2013.01); C03C 2204/04 (2013.01);
Abstract

A quartz glass provides an opaque quartz glass having high light-shielding property, excellent mechanical strength and excellent cleaning resistance against hydrofluoric acid. By setting the maximum width of the amorphous bubbles existing in the opaque quartz glass to an average of 3 to 15 μm and the density to 2.15 g/cmor more, the mechanical strength after baking and the cleaning resistance by hydrofluoric acid are improved. The opaque quartz glass has a whiteness at a thickness of 10 mm of 75 to 90%, the reflectance of light with a wavelength of 0.24 to 2.6 μm at a thickness of 4 mm is 60 to 85%, and the bending strength after baking is 95 MPa. In addition, a foaming agent may be mixed in the opaque quartz glass. An opaque quartz glass having cleaning resistance against acid can be obtained.


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