The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2024
Filed:
Nov. 21, 2020
Soochow University, Suzhou, CN;
Haidong He, Suzhou, CN;
Zijie Xi, Suzhou, CN;
Chunju Wang, Suzhou, CN;
Lining Sun, Suzhou, CN;
Xuezhong Ning, Suzhou, CN;
SOOCHOW UNIVERSITY, Suzhou, CN;
Abstract
A method for preparing a cross-dimension micro-nano structure array includes: S1. providing a workpiece immersed in the electrolyte as the first electrode, providing a trimming wire electrode as the second electrode and setting it above the workpiece, providing an interference beam adjuster and outputting multi-beam laser interference to irradiate the surface of the workpiece; S2. The power supply between the first electrode and the second electrode forms a loop, and drives the trimming wire electrode to reciprocate relative to the workpiece, and the workpiece undergoes electrochemical dissolution or electrochemical deposition at the corresponding position of the trimming wire electrode, and form a micro-nano structure array without a mask, and solves the problem of low output power of the existing ultrashort pulse power supply, improves the processing accuracy of the micro-nano structure array, does not require electrolyte for high-speed flow, and improves system safety and reduce the cost.