The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2024

Filed:

Dec. 31, 2021
Applicant:

Nxp B.v., Eindhoven, NL;

Assignee:

NXP B.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/737 (2006.01); H01L 27/06 (2006.01); H01L 29/08 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/737 (2013.01); H01L 27/0623 (2013.01); H01L 29/0821 (2013.01); H01L 29/66242 (2013.01);
Abstract

A semiconductor device and fabrication method are described for manufacturing a heterojunction bipolar transistor by forming a silicon collector region in a substrate which includes a lower collector layer, a dopant diffusion barrier layer, and an upper collector layer, where the formation of the dopant diffusion barrier layer reduces diffusion of dopants from the lower collector layer into the upper collector layer during one or more subsequent manufacturing steps which are used to form a trench isolation region in the substrate along with a heterogeneous base region and a silicon emitter region.


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