The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2024

Filed:

Aug. 06, 2021
Applicant:

Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Guangdong, CN;

Inventor:

Ziran Li, Guangdong, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1248 (2013.01); H01L 27/1259 (2013.01);
Abstract

An embodiment of the present application discloses an array substrate and a manufacturing method thereof. The array substrate includes an underlay, an active layer, a gate electrode insulation layer, and a metal layer. A first through hole, second through holes, third through holes, and a fourth through hole are defined in the gate electrode insulation layer. The second through holes and third through holes are arranged at intervals such that partial regions of the active layer are shielded by the gate electrode insulation layer to prevent them from corrosion of an etching solution to guarantee a normal electrical connection of the active layer and a source electrode and a drain electrode and improve a yield rate of the array substrate.


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Li, Ziran. (2024). Array substrate and manufacturing method thereof (U.S. Patent No. 11990483). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11990483

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