The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2024

Filed:

Oct. 21, 2019
Applicant:

Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;

Inventors:

Syunsuke Hirano, Yamagata, JP;

Yoshihiro Kato, Fukushima, JP;

Takaaki Ogashiwa, Yamagata, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/48 (2006.01); C23C 18/16 (2006.01); C23C 18/18 (2006.01); C23C 18/38 (2006.01); C25D 3/38 (2006.01); C25D 5/02 (2006.01); C25D 5/34 (2006.01); C25D 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/4857 (2013.01); C23C 18/1603 (2013.01); C23C 18/1803 (2013.01); C23C 18/38 (2013.01); C25D 3/38 (2013.01); C25D 5/02 (2013.01); C25D 5/34 (2013.01); C25D 7/00 (2013.01);
Abstract

A method for manufacturing a package substrate including an insulating layer and a wiring conductor, including: forming, on one or both sides of a core resin layer, a substrate including a peelable first metal layer that has a thickness of 1-70 μm, a first insulating resin layer, and a second metal layer; forming a non-through hole reaching a surface of the first metal layer, performing electrolytic and/or electroless copper plating on its inner wall, and connecting the second and first metal layers; arranging a second insulating resin layer and a third metal layer and heating and pressurizing the first substrate to form a substrate; forming a non-through hole reaching a surface of the second metal layer, performing electrolytic and/or electroless copper plating on its inner wall, and connecting the second and third metal layers; peeling a third substrate; and patterning the first and third metal layers to form the wiring conductor.


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