Stochastic contour prediction system, method of providing the stochastic contour prediction system, and method of providing euv mask using the stochastic contour prediction system

Abstract

The inventive concepts provide a method of providing a stochastic prediction system. The method includes extracting contours of patterns corresponding to a first design layout from a plurality of scanning electron microscope (SEM) images, respectively, generating a first contour histogram image based on the contours, and training a stochastic prediction model by using the first contour histogram image as an output, and by using the first design layout and a first resist image, a first aerial image, a first slope map, a first density map, and/or a first photo map corresponding to the first design layout as inputs, in which the stochastic prediction model comprises a cycle generative adversarial network (GAN).