The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2024

Filed:

Jan. 27, 2021
Applicant:

Palo Alto Research Center Incorporated, Palo Alto, CA (US);

Inventor:

Thomas Wunderer, Santa Cruz, CA (US);

Assignee:

XEROX CORPORATION, Norwalk, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/04 (2006.01); C30B 29/40 (2006.01); G02B 6/122 (2006.01); H01L 21/02 (2006.01); G02B 6/12 (2006.01);
U.S. Cl.
CPC ...
G02B 6/1225 (2013.01); C30B 25/04 (2013.01); C30B 29/403 (2013.01); H01L 21/02642 (2013.01); G02B 2006/1213 (2013.01); G02B 2006/12178 (2013.01);
Abstract

A mask material is deposited on a substrate or growth template. The substrate or growth template is compatible with crystalline growth of a crystalline optical material. Patterned portions of the mask material are removed to expose one or more regions of the substrate or growth template. The one or more regions have target shapes of one or more optical components. The crystalline optical material is selectively grown in the one or more regions to form the one or more optical components.


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