The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2024
Filed:
Apr. 23, 2019
Mitsubishi Electric Corporation, Tokyo, JP;
Tokyo Institute of Technology, Tokyo, JP;
Kyohei Aketagawa, Tokyo, JP;
Isamu Hirashiki, Tokyo, JP;
Tomohiro Nozaki, Tokyo, JP;
Kenta Sakata, Tokyo, JP;
MITSUBISHI ELECTRIC CORPORATION, Tokyo, JP;
TOKYO INSTITUTE OF TECHNOLOGY, Tokyo, JP;
Abstract
This gas production system includes: a gas production device having a reactor forming a flow path for a treatment target gas, a first electrode and a second electrode to which voltage is applied, and a catalyst layer provided in the flow path and containing a catalyst; voltage generation means for generating voltage to be applied to the first electrode and the second electrode; and gas supply means for supplying the treatment target gas to the gas production device. The voltage generation means has frequency setting means for setting the frequency of the voltage in accordance with the treatment target gas, plasma generated between the first electrode and the second electrode is applied to the catalyst layer, and the treatment target gas is reformed to obtain a product gas.