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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11987021 B1

PDFFull Text
Date of Patent:
May. 21, 2024

Filed:

Sep. 01, 2021

Multilayer riblet appliques

Applicant:

The Boeing Company, Chicago, IL (US);

Inventors:

George Michael Granger, Redmond, WA (US);

Mitchell Nakaki, Los Angeles, CA (US);

Maribel G. Locsin, Seattle, WA (US);

Denise A. Blohowiak, Issaquah, WA (US);

Kelcey D. Sterling, Seattle, WA (US);

Assignee:

The Boeing Company, Arlington, VA (US);

Attorney:

HANLEY, FLIGHT & ZIMMERMAN, LLC

Primary Examiner:

Catherine A Simone

Int. Cl.
CPC ...
B32B 25/20 (2006.01); B32B 3/30 (2006.01); B32B 7/12 (2006.01); B32B 25/08 (2006.01); B64C 21/10 (2006.01);
U.S. Cl.
CPC ...
B32B 25/20 (2013.01); B32B 3/30 (2013.01); B32B 7/12 (2013.01); B32B 25/08 (2013.01); B64C 21/10 (2013.01); B32B 2605/18 (2013.01);
Abstract

Multilayer riblet appliques are disclosed. An example riblet applique includes a fluorosilicone riblet structure including riblet ridges and a base from which the riblet ridges extend, and a support layer proximate the fluorosilicone riblet structure. The support layer includes a vacuum-plasma-treated polymer film having a first surface and a second surface opposite the first surface, and a polymer sub-layer proximate the second surface of the polymer film.

Find Patent Forward Citations

Granger, George. (2024). Multilayer riblet appliques (U.S. Patent No. 11987021). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11987021

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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