The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2024
Filed:
Sep. 02, 2020
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Mikiya Sakashita, Nagoya Aichi, JP;
Yumiko Kataoka, Yokkaichi Mie, JP;
Yukiteru Matsui, Nagoya Aichi, JP;
Assignee:
Kioxia Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/015 (2012.01); B24B 37/013 (2012.01); C08L 1/08 (2006.01); C09G 1/02 (2006.01);
U.S. Cl.
CPC ...
B24B 37/015 (2013.01); B24B 37/013 (2013.01); C09G 1/02 (2013.01); C08L 1/08 (2013.01);
Abstract
According to one embodiment, a polishing method includes supplying a polishing agent to be between a polishing pad and to-be-polished surface, then polishing the to-be-polished surface with the polishing agent while rotating at least one of the to-be-polished surface and the polishing pad. The polishing agent includes abrasive grains and an organic polymer. The organic polymer makes a reversible phase transition between a gel state and a sol state depending on temperature.