The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2024
Filed:
Mar. 29, 2019
Soudal, Turnhout, BE;
Peter Geboes, Turnhout, BE;
Ivan Boeykens, Turnhout, BE;
Thomas Duijsters, Turnhout, BE;
Lieven Sichien, Turnhout, BE;
Soudal, Turnhout, BE;
Abstract
Dispensing system for dispensing a mixture of a first component and a second component, the dispensing system comprising: (i) a dispensing gun comprising an inlet body with a first passage for feeding in the first component under pressure and a second passage for feeding in the second component under pressure, the first and second passages respectively comprising a closable first outlet and a closable second outlet, which may be operable by means of a handle or trigger of the dispensing gun; (ii) a static mixing nozzle, detachably connectable to the outlets of the body and provided for mixing and dispensing the components, the static mixing nozzle comprising a first section containing a first chamber and a second chamber for conducting the first and second component respectively and a second section, subsequent to the first section (in forwards flow direction), containing a mixing chamber with static mixing elements which promote mixing the first and second components and conducting the mixture to a nozzle tip serving as an outlet for the mixture. According to the invention, at least one of the first and second chambers of the static mixing nozzle contains a series of static backflow prevention elements, arranged for hindering backflow of the respective component within the respective chamber.