The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2024
Filed:
Feb. 21, 2020
President and Fellows of Harvard College, Cambridge, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Donggyu Kim, Cambridge, MA (US);
Alexander Keesling Contreras, Boston, MA (US);
Ahmed Omran, Somerville, MA (US);
Harry Jay Levine, Cambridge, MA (US);
Hannes Bernien, Somerville, MA (US);
Mikhail D. Lukin, Cambridge, MA (US);
Dirk R. Englund, Cambridge, MA (US);
President and Fellows of Harvard College, Cambridge, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
A method of generating uniform large-scale optical focus arrays (LOT As) with a phase spatial light modulator (SLM) includes identifying and removing undesired phase rotation in the iterative Fourier transform algorithm (IFTA), thereby producing computer-generated holograms of highly uniform LOT As using a reduced number of iterations as compared to a weighted Gerchberg-Saxton algorithm. The method also enables a faster compensation of optical system-induced LOT A intensity inhomogeneity than the conventional IFTA.