The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2024
Filed:
Oct. 13, 2022
Sumco Corporation, Tokyo, JP;
Kazuhiro Narahara, Minato-ku, JP;
SUMCO CORPORATION, Tokyo, JP;
Abstract
Provided is a susceptor which makes it possible to increase the circumferential flatness uniformity of an epitaxial layer of an epitaxial silicon wafer. A susceptoris provided with a concave counterbore portion on which a silicon wafer W is placed, and the radial distance L between the center of the susceptor and an opening edge of the counterbore portion varies at 90° periods in the circumferential direction. Meanwhile, when the angle at which the radial distance L is minimum is 0°, the radial distance L is a minimum value Lat 90°, 180°, and 270°; and the radial distance L is a maximum value Lat 45°, 135°, 225°, and 315°. Accordingly, the pocket width Lalso varies in conformance with the variations of the radial distance L. The opening edgeC describes four elliptical arcs being convex radially outward when the susceptoris viewed from above.