The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2024

Filed:

Jan. 12, 2021
Applicant:

Gudeng Precision Industrial Co., Ltd., New Taipei, TW;

Inventors:

Chia-Ho Chuang, New Taipei, TW;

Hsing-Min Wen, New Taipei, TW;

Yi-Hsuan Lee, New Taipei, TW;

Hsin-Min Hsueh, New Taipei, TW;

Ming-Chien Chiu, New Taipei, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/66 (2012.01); B65D 81/24 (2006.01); B65D 85/30 (2006.01); G03F 1/22 (2012.01); G03F 7/00 (2006.01); G06K 7/14 (2006.01); H01L 21/67 (2006.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
G03F 1/66 (2013.01); B65D 81/24 (2013.01); B65D 85/30 (2013.01); G03F 1/22 (2013.01); G03F 7/70741 (2013.01); G06K 7/14 (2013.01); H01L 21/67294 (2013.01); H01L 21/67353 (2013.01); H01L 21/67359 (2013.01); H01L 21/67366 (2013.01); H01L 21/67376 (2013.01); H01L 21/67386 (2013.01);
Abstract

The invention discloses a reticle pod including a base and a lid mounted to the base. The base has a bottom surface having at least one first mark and at least one second mark. The first mark has a first reflectivity relative to a light source, and the second mark has a second reflectivity relative to the light source. The first reflectivity is different from the second reflectivity, and both are also different from that of the rest area of the bottom surface.


Find Patent Forward Citations

Loading…