The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2024
Filed:
Aug. 07, 2023
Applicant:
Huaqiao University, Fujian, CN;
Inventors:
Assignee:
HUAQIAO UNIVERSITY, Fujian, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 3/54 (2006.01);
U.S. Cl.
CPC ...
G01N 3/54 (2013.01); G01N 2203/0078 (2013.01); G01N 2203/0226 (2013.01); G01N 2203/0298 (2013.01); G01N 2203/0641 (2013.01);
Abstract
A method for testing an interfacial tribochemical reaction between a diamond wafer and active metal abrasive or metal oxide abrasive is provided. A surface of a diamond indenter used in a nano scratch tester is coated with a layer of the active metal abrasive or the metal oxide abrasive with uniform and controllable thickness by magnetron sputtering, and an interface interaction between the layer of the active metal abrasive or the metal oxide abrasive and the diamond wafer is controlled by a scratch test of the diamond wafer. Chemical components of an interaction section on a surface of the diamond wafer are analyzed by the scanning probe micro Raman spectrometer.