The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2024
Filed:
Sep. 17, 2018
Applicants:
Stc.unm, Albuquerque, NM (US);
Sang Eon Han, Albuquerque, NM (US);
Sang M. Han, Albuquerque, NM (US);
Inventors:
Sang Eon Han, Albuquerque, NM (US);
Sang M. Han, Albuquerque, NM (US);
Assignee:
UNM Rainforest Innovations, Albuquerque, NM (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/47 (2006.01); B82Y 40/00 (2011.01); C08J 9/26 (2006.01); G01N 21/27 (2006.01); G01N 23/2202 (2018.01); G01N 23/2251 (2018.01); G02B 5/02 (2006.01); G06T 7/50 (2017.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
C08J 9/26 (2013.01); B82Y 40/00 (2013.01); G01N 21/278 (2013.01); G01N 23/2202 (2013.01); G01N 23/2251 (2013.01); G02B 5/0268 (2013.01); G06T 7/50 (2017.01); H01J 37/26 (2013.01); G02B 2207/109 (2013.01);
Abstract
A method and resulting device that mimics the light scattering properties of a random structural pattern using microspheres.