The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2024
Filed:
Dec. 09, 2020
Zhongtian Technology Advanced Materials Co., Ltd., Nantong, CN;
Jiangsu Zhongtian Technology Co., Ltd., Nantong, CN;
Ming-Ming Tang, Nantong, CN;
Meng-Fei Wang, Nantong, CN;
Yi-Gang Qian, Nantong, CN;
Jun-Yi Ma, Nantong, CN;
Xian-Gen Zhang, Nantong, CN;
Yi-Chun Shen, Nantong, CN;
Ya-Li Chen, Nantong, CN;
ZHONGTIAN TECHNOLOGY ADVANCED MATERIALS CO., LTD., Nantong, CN;
JIANGSU ZHONGTIAN TECHNOLOGY CO., LTD., Nantong, CN;
Abstract
A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile