The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2024

Filed:

Dec. 19, 2022
Applicant:

Chung Ang University Industry Academic Cooperation Foundation, Seoul, KR;

Inventors:

Sang Kwon Lee, Seongnam-si, KR;

No Won Park, Jeonju-si, KR;

Jae Won Choi, Seoul, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10N 10/852 (2023.01); H10N 10/01 (2023.01);
U.S. Cl.
CPC ...
H10N 10/852 (2023.02); H10N 10/01 (2023.02);
Abstract

A transition dichalcogenide homojunction structure may include a lower high resistance layer including a plurality of PtXlayers and an upper low resistance layer which includes the plurality of PtXlayers and has different thickness and number of growth layers from the lower high resistance layer. And the lower high resistance layer and the upper low resistance layer may form a homojunction. The heat transfer characteristic of the lower high resistance layer may increase by the interface induced Seebeck effect with the upper low resistance layer. The transition dichalcogenide homojunction structure may generate the interface induced Seebeck effect at the interface of the homojunction to generate a thermal voltage. Further, the transition metal dichalcogenide homojunction structure may measure the Seebeck effect of the lower high resistance layer using the upper low resistance layer without separate measurement equipment.


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