The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2024

Filed:

Nov. 11, 2021
Applicant:

Darwin Precisions Corporation, Hsinchu County, TW;

Inventors:

Yun-Pei Yang, Hsinchu County, TW;

Mei-Lun Li, Hsinchu County, TW;

Wen-Yi Lin, Hsinchu County, TW;

Assignee:

DARWIN PRECISIONS CORPORATION, Hsinchu County, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10K 50/00 (2023.01); C23C 14/04 (2006.01); H10K 71/16 (2023.01);
U.S. Cl.
CPC ...
H10K 50/00 (2023.02); C23C 14/042 (2013.01); H10K 71/166 (2023.02);
Abstract

A metal mask and an inspecting method thereof are provided for improving quality standard detection. The metal mask has a first and a second long side and plural pattern regions. The method includes the followings steps Based on the pattern regions adjacent to the first and second long sides, a first and a second reference straight line adjacent to the first and second long sides respectively are defined. Then, a first maximum offset length between the pattern regions and the first reference straight line is measured. A second maximum offset length between the pattern regions and the second reference straight line is measured. When a difference between the first and second maximum offset lengths is less than or equal to 20 μm, the metal mask is determined to meet an inspecting standard.


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