The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2024

Filed:

Sep. 25, 2019
Applicant:

Sekisui Chemical Co., Ltd., Osaka, JP;

Inventors:

Katsunori Mutou, Aichi, JP;

Sachiko Nakao, Aichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 17/00 (2006.01); B32B 7/12 (2006.01); B32B 15/09 (2006.01); B32B 15/20 (2006.01); B32B 27/20 (2006.01); B32B 27/36 (2006.01); C23C 14/20 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01Q 17/00 (2013.01); B32B 7/12 (2013.01); B32B 15/09 (2013.01); B32B 15/20 (2013.01); B32B 27/20 (2013.01); B32B 27/365 (2013.01); C23C 14/205 (2013.01); C23C 14/34 (2013.01); B32B 2255/10 (2013.01); B32B 2255/205 (2013.01); B32B 2264/1022 (2020.08); B32B 2307/204 (2013.01); B32B 2307/416 (2013.01);
Abstract

An object is to provide a λ/4 radio wave absorber that includes a support, a resistive film, a dielectric layer, and a reflective layer, and that has higher radio wave absorption performance. The object is achieved by a λ/4 radio wave absorber that includes a support, a resistive film, a dielectric layer, and a reflective layer, and that satisfies formula (1): −0.375x+1086.9<y<−0.375x+1140 wherein x represents a resistance value of the resistive film, and y=the thickness of the support×(the relative permittivity of the support)+the thickness of the dielectric layer×(the relative permittivity of the dielectric layer).


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